| 摘要 |
<p>Vacuum processing apparatuses (1, 10, 101, 301) are provided with at least three transfer chambers (11, 12, 13) having transfer robot arms (11a, 12a, 13a) for transferring a substrate; one or more processing chambers (51, 52, 61, 62, 71-75) connected to each transfer chamber; one common vacuum chamber (21, 102), which has one or more substrate placing sections (21a;102a, 102b) inside, is arranged at a position which permits each transfer robot arm of at least three transfer chambers to reach the substrate placing section, and transfers the substrate between each of at least two transfer chambers and at least one substrate placing section; and a load lock chambers (81, 82) connected to at least one transfer chamber.</p> |
