| 摘要 |
An apparatus for trapping semiconductor reaction byproducts is provided to easily remove collected reaction byproducts by installing reaction byproducts trapping apparatus in a pipe line like an H-type pipe. An inlet and an outlet are respectively formed on the upper and lower surfaces of a hollow body. A collection box whose one surface is open is formed at the outlet in the body. A plurality of plates are disposed on the upper surface of the collection box, vertically running in parallel with each other and separated from each other by a predetermined interval. A heater is inserted into one surface of the body to penetrate the plurality of plates. Reaction byproducts are introduced into the inlet of the hollow body, sequentially penetrate the plates, and are exhausted to the outlet of the hollow body via the collection box. At least one of the plates is extended to the open portion of the collection box. The inlet and outlet of the hollow body can cross each other.
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