发明名称 PHOTOSENSITIVE PASTE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive paste for producing barrier ribs which undergoes a little change in a dimension before and after baking and ensure little outgassing. <P>SOLUTION: [1] The photosensitive paste contains (A) inorganic particles, (B) an alkali-soluble resin, (C) a crosslinking agent, (D) an acid generator and (E) an organic solvent, wherein the component (A) contains silica (A-a) as an essential component and the alkali-soluble resin (B) is an organic resin having a thermal mass reduction rate in baking at 580&deg;C for 0.5 h being &ge;90 wt. There are also provided [2] barrier ribs for a plasma display using the photosensitive paste [1] and [3] a member for a plasma display equipped with the barrier ribs [2]. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008040050(A) 申请公布日期 2008.02.21
申请号 JP20060212948 申请日期 2006.08.04
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;YAHAGI AKIRA
分类号 G03F7/038;G03F7/004;G03F7/029;G03F7/075;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/36 主分类号 G03F7/038
代理机构 代理人
主权项
地址