| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having resistance to noble metal plating in a neutral to alkaline cyanide plating bath and excellent in resolution, adhesion and resist removability, a photosensitive resin laminate using the photosensitive resin composition, a method for forming a resist pattern on a substrate using the photosensitive resin laminate, and uses of the resist pattern. <P>SOLUTION: The photosensitive resin composition comprises (a) 20-90 mass% of a carboxyl group-containing binder, (b) 5-75 mass% of an addition polymerizable monomer having at least one terminal ethylenically unsaturated group and (c) 0.01-30 mass% of a photopolymerization initiator, wherein the carboxyl group-containing binder (a) comprises a specific copolymer and the photopolymerizable monomer (b) comprises a specific compound. <P>COPYRIGHT: (C)2008,JPO&INPIT |
