发明名称 Control of X-ray beam spot size
摘要 A method for analysis of a sample includes directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles. For each of the different angles, a respective offset of the beam in a direction transverse to the beam axis is determined. While sensing the radiation scattered from the sample at each of the different elevation angles in succession, a transverse correction is applied to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.
申请公布号 US2008043914(A1) 申请公布日期 2008.02.21
申请号 US20070822231 申请日期 2007.07.03
申请人 JORDAN VALLEY SEMICONDUCTORS LTD. 发明人 MAZOR ISAAC;BERMAN DAVID
分类号 G01B15/02 主分类号 G01B15/02
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