发明名称 Method, device and program for setting a reference value for substrate inspection
摘要 Where substrates with components are produced through a series of production processes and inspected after each of these production processes, a method is provided for setting an optimum reference value for making judgments in these inspections such that the frequency of occurrence of disagreement between inspection results after an intermediate process and after the final results will come to within a specified range. After an initial value is assigned for a reference value, this value is sequentially varied while repeating specified processes of saving measured and judgment data on inspected portions of components in a memory and setting a reference value by using the data saved in the memory until a specified condition becomes satisfied.
申请公布号 US2008046210(A1) 申请公布日期 2008.02.21
申请号 US20070824277 申请日期 2007.06.28
申请人 OMRON CORPORATION 发明人 MURAKAMI KIYOSHI
分类号 G06F19/00;H05K3/00;H05K3/34;H05K13/08 主分类号 G06F19/00
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