发明名称 TECHNIQUE FOR IMPROVING UNIFORMITY OF A RIBBON BEAM
摘要 A technique for improving uniformity of a ribbon beam is disclosed. In one particular exemplary embodiment, an apparatus (300) may comprise a first corrector-bar assembly (302) and a second corrector-bar assembly (304), wherein the second corrector-bar assembly is located at a predetermined distanced from the first corrector-bar assembly. Each of a first plurality of coils in the first corrector-bar assembly may be individually excited to deflect at least one beamlet in the ribbon beam(30), thereby causing the beamlets to arrive at the second corrector-bar assembly in a desired spatial spread. Each of a second plurality of coils in the second corrector-bar assembly may be individually excited to further deflect one or more beamlets in the ribbon beam, thereby causing the beamlets to exit the second corrector-bar assembly at desired angles.
申请公布号 WO2007084628(A3) 申请公布日期 2008.02.21
申请号 WO2007US01356 申请日期 2007.01.19
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;PURSER, KENNETH, H.;GUPTA, ATUL 发明人 PURSER, KENNETH, H.;GUPTA, ATUL
分类号 H01J37/147;H01J37/30 主分类号 H01J37/147
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