| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To avoid generation of a pseudo error and to efficiently extract only an error by a simplified verification method of verification figures according to the characteristics of deviation occurring in the figures relating to a verification method for a mask layout figure and an optical image. <P>SOLUTION: Each vertex of a mask layout figure 1 is classified into at least tips, corners and minute level difference; the mask layout figure 1 and an optical image 2 by optical simulation are compared with each other; and only a projection or a recess is validated at a tip, only a constricted portion is verified in a corner, and only deviation from a dimension of the mask layout figure is verified in a minute level difference. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
