发明名称 CONTINUOUS LITHOGRAPHY APPARATUS AND METHOD USING ULTRAVIOLET ROLL NANOIMPRINTING
摘要 <p>A continuous lithography apparatus using an ultraviolet roll is provided to embody formation of a high-density high-integrated circuit pattern by forming a fine pattern as compared with a conventional dry film process. By using a pattern roll stamper(321) having a pattern, an ultraviolet roll nano imprinting process is performed on a photoresist layer formed on a conductive layer to form a photoresist layer pattern. A first removing part removes a residual photoresist layer. A second removing part removes the exposed portion of the conductive layer. A third removing part removes the rest of the photoresist layer. The conductive layer can be formed on an insulation substrate.</p>
申请公布号 KR100804734(B1) 申请公布日期 2008.02.19
申请号 KR20070017733 申请日期 2007.02.22
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 KANG, SHIN ILL;AHN, SU HO
分类号 H01L21/027 主分类号 H01L21/027
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