发明名称 |
CONTINUOUS LITHOGRAPHY APPARATUS AND METHOD USING ULTRAVIOLET ROLL NANOIMPRINTING |
摘要 |
<p>A continuous lithography apparatus using an ultraviolet roll is provided to embody formation of a high-density high-integrated circuit pattern by forming a fine pattern as compared with a conventional dry film process. By using a pattern roll stamper(321) having a pattern, an ultraviolet roll nano imprinting process is performed on a photoresist layer formed on a conductive layer to form a photoresist layer pattern. A first removing part removes a residual photoresist layer. A second removing part removes the exposed portion of the conductive layer. A third removing part removes the rest of the photoresist layer. The conductive layer can be formed on an insulation substrate.</p> |
申请公布号 |
KR100804734(B1) |
申请公布日期 |
2008.02.19 |
申请号 |
KR20070017733 |
申请日期 |
2007.02.22 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
发明人 |
KANG, SHIN ILL;AHN, SU HO |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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