发明名称 Vertical electromechanical memory devices and methods of manufacturing the same
摘要 In a memory device and a method of forming a memory device, the device comprises a substrate, a first electrode extending in a vertical direction relative to the substrate, and a second electrode extending in a vertical direction relative to the substrate, the second electrode being spaced apart from the first electrode by a vertical gap. A third electrode is provided that extends in a vertical direction in the electrode gap, the third electrode being spaced apart from the first electrode by a first gap and the third electrode being spaced apart from the second electrode by a second gap, the third electrode being elastically deformable such that the third electrode deflects to be electrically coupled with the first electrode through the first gap in a first bent position and to be electrically coupled with the second electrode through the second gap in a second bent position, and to be isolated from the first electrode and the second electrode in a rest position.
申请公布号 US2008035928(A1) 申请公布日期 2008.02.14
申请号 US20070788011 申请日期 2007.04.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YUN EUNJUNG;LEE SUNG-YOUNG;KIM MIN-SANG;KIM SUNGMIN
分类号 H01L21/8229;G11C11/34;H01L21/336;H01L29/10 主分类号 H01L21/8229
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