| 摘要 |
<p>A damper that has chemical resistance, that can be used under a high-pressure environment, and that can remove pressure pulsations is provided. This damper includes a fluid chamber (23) into and out of which a fluid flows, a diaphragm (71) defining at least one surface of the fluid chamber (23), and a separate chamber (53) adjacent to the fluid chamber (23) in a fluid-tight manner, with the diaphragm (71) disposed therebetween. The diaphragm (71) includes a first film (73) having chemical resistance and a second film (75) having pressure resistance.</p> |
