发明名称 Substrate inspection system, substrate inspection method, and substrate inspection apparatus
摘要 It is an object of the present invention to provide a substrate inspection system, a substrate inspection method, and a substrate inspection apparatus for realizing efficient operation of inspecting both a large region and a small region of a substrate. The present invention includes a first inspection apparatus 11 executing a macro inspection of each of a plurality of substrates 14 (l) to 14 (n) and outputting information on presence/absence of a defect on each of the substrates; a storage unit 12 storing therein the information on presence/absence of a defect outputted from the first inspection apparatus for each of the substrates; and a second inspection apparatus 13 executing an inspection of a predetermined portion of the substrate. The second inspection apparatus refers to the presence/absence information stored in the storage unit, and inspects a substrate, the one without a defect, of the plural substrates 14 (l) to 14 (n).
申请公布号 US7330042(B2) 申请公布日期 2008.02.12
申请号 US20040807262 申请日期 2004.03.24
申请人 NIKON CORPORATION 发明人 FUKAZAWA KAZUHIKO;KAWASHIMA YASUTO
分类号 G01N21/88;G01R31/28;G01N21/95;G01N21/956;G06K9/00;H01L21/66 主分类号 G01N21/88
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