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发明名称
Method for processing a optical proximity correction of semiconductor device's pattern
摘要
申请公布号
KR100801737(B1)
申请公布日期
2008.02.11
申请号
KR20060058934
申请日期
2006.06.28
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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