IMAGE SENSOR FABRICATING METHOD

摘要

A method for manufacturing an image sensor is provided to form a gapless micro-lens in an exposure process for a photoresist layer. A photoresist layer(25) for forming a micro-lens is formed on a color filter array. A first exposure process is performed by using a first mask. A line-shaped pattern in a first direction with respect to the photoresist layer is formed on the first mask. A second exposure process is performed by using a second mask(31). A line-shaped pattern in a second direction with respect to the photoresist layer is formed on the second mask. A micro-lens is formed by performing a developing process with respect to the photoresist layer.