发明名称 IMAGE EXPOSURE APPARATUS
摘要 <p>a spatial light modulating element (50), constituted by a plurality of pixel portions for individually modulating light irradiated thereon; a light source (66), for irradiating a light beam B on the spatial light modulating element; and optical system (51), for focusing an image borne by each of the pixel portions; and a micro lens array (55), in which a plurality of micro lenses (55a) into which the light beams modulated by the pixel portions enter individually are provided in an array. The micro lens array 55 is provided in the vicinity of a focusing position of the pixel portions by the focusing optical system (51). Each micro lens (55a) of the micro lens array (55) has different powers in two directions within a plane perpendicular to the optical axis, to correct aberrations caused by anisotropic distortions in the pixel portions.</p>
申请公布号 KR20080012334(A) 申请公布日期 2008.02.11
申请号 KR20077028147 申请日期 2007.11.30
申请人 FUJI FILM CORPORATION 发明人 SUMI KATSUTO;ISHII SHUICHI
分类号 G02B3/00;H01L21/027 主分类号 G02B3/00
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