发明名称 Photoresist composition with antibacterial agent
摘要 A photoresist composition, e.g., a positive acting resist, for use in the formation of circuit patterns and the like on printed circuit boards and the like circuitized substrates, the photoresist composition including a quantity of silver therein in a sufficient amount to substantially prevent bacteria formation within said composition. A method of making the composition is also provided.
申请公布号 US2008026316(A1) 申请公布日期 2008.01.31
申请号 US20060492029 申请日期 2006.07.25
申请人 ENDICOTT INTERCONNECT TECHNOLOGIES, INC. 发明人 KEESLER ROSS W.;KONRAD JOHN J.;MAGNUSON ROY H.;SINICKI ROBERT A.
分类号 G03C1/00 主分类号 G03C1/00
代理机构 代理人
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