APPARATUS FOR CHEMICAL VAPOR DEPOSITION AND METHOD OF CHEMICAL VAPOR DEPOSITION

摘要

An apparatus which comprises: a packing part (10) for packing a raw deposition material; a decomposition oven (2) for decomposing the raw deposition material; an opening/closing valve (4) for connecting the packing part (10) to the decomposition oven (2); and a polymerization part (3) where the raw deposition material decomposed in the decomposition oven is polymerized to form a coating film on the surface of a work. The raw deposition material packed in the packing part (10) is vaporized. The opening/closing valve (4) is opened to thereby feed the raw deposition material vaporized to the decomposition oven (3). Thus, a coating film is formed.