| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce displacement of a substrate stage by accurately correcting an error depending on a combination of a stage and a position measuring gauge such as Abbe error and shape error of reflecting mirror or the like, in the exposure apparatus where a plurality of substrate stages move among a plurality of stations. <P>SOLUTION: The exposure apparatus is provided with a control device including a storage unit 103 and correcting units 102, 105. The storage unit 103 stores correction information of the measuring result that is determined for each combination of a plurality of substrate stages 7, 8 and a plurality of position measuring gauges 101, 106. The correcting units 102, 105 respectively correct the measuring results of the plurality of position measuring gauges 101, 106, on the basis of the correction information corresponding to a combination of the substrate stages 7, 8 and position measuring gauges 101, 106 among the correction information stored in the storage unit 103. <P>COPYRIGHT: (C)2008,JPO&INPIT |
