发明名称 |
LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD |
摘要 |
An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source. |
申请公布号 |
EP1659620(A4) |
申请公布日期 |
2008.01.30 |
申请号 |
EP20040772736 |
申请日期 |
2004.08.27 |
申请人 |
NIKON CORPORATION |
发明人 |
ARAI, DAI;HARA, HIDEAKI;TAKAIWA, HIROAKI |
分类号 |
H01L21/027;G03B27/42;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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