发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.</p> |
申请公布号 |
SG138458(A1) |
申请公布日期 |
2008.01.28 |
申请号 |
SG20040040713 |
申请日期 |
2004.06.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DRAAIJER, EVERT HENDRIK JAN;CUIJPERS, MARTINUS AGNES WILLEM;FIEN, MENNO;BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED;HOUKES, MARTIJN;VAN DONKELAAR, EDWIN TEUNIS |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|