| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment device for sufficiently collecting sublimate generated from coating liquid, and for suppressing its adhesion. SOLUTION: A substrate W coated with the coating liquid of a reflection prevention film is placed and heated on a heat treatment plate 211. Nitrogen gas supplied from a gas supply source 255 is made to flow from the periphery of the heat treatment plate 211 through a clearance between an inside cover 246 and an outside cover 243 to a heat treatment space 230. An exhaust port 266 is opened at the upper part of the central part of the inside cover 246, and an internal wall face 246a of the inside cover 246 is formed as a taper face expanded from the exhaust port 266 to the heat treatment plate 211. Thus, the air flow of nitrogen gas is made to smoothly flow along the taper face of the internal wall face 246a, and the sublimate generated from the coating liquid is smoothly ejected from the exhaust port 260 with the air flow. Therefore, it is possible to sufficiently collect the sublimate and to suppress its adhesion. COPYRIGHT: (C)2008,JPO&INPIT
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