| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that increases the measurement accuracy for measuring a surface shape of a substrate, and also to provide a device manufacturing method. <P>SOLUTION: An exposure apparatus comprises a measurement station, an exposure station, and a stage configured to hold and move a substrate. The exposure apparatus uses a measurement device included in the measurement station to measure the position of a surface of the substrate held by the stage with respect to multiple measurement points on the surface, moves the substrate, the surface position of which has been measured, from the measurement station to the exposure station, and exposures the moved substrate to light in the exposure station. Based on an output from the measurement device which is obtained with respect to the multiple measurement points, the index concerting the error of a measured value obtained by the measurement means is calculated with respect to each of the multiple measurement points. Based on the calculated indexes, arrangement of the multiple measurement points are set. <P>COPYRIGHT: (C)2008,JPO&INPIT |
