| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a hole formation method capable of forming a hole in a shape where the diameter of the hole is close to a fixed value at the upper and bottom parts. <P>SOLUTION: The hole formation method includes: a hole formation step for forming a hole by etching a first film formed on a substrate; a second film deposition step of depositing a second film on the first film so that the upper side of the hole becomes thick and the bottom side becomes thin; and a shape correction step of correcting the shape of the hole by etching the first and second films. <P>COPYRIGHT: (C)2008,JPO&INPIT |
