| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask PM3 for a color filter which is for forming 2 kinds of photo-spacers each having different height at the same time, has a simple structure at a low cost, is capable of obtaining a properly photo-cured second photospacer Ps-2e, is adjsuted to an optional width and is capable of forming the second phtospacer hardly peeled off. SOLUTION: A rectangular light shielding pattern P1 is provided inside an opening part K2 on the photomask corresponding to the formation of the photo-spacer (the second photo-spacer) having low height. The outside shape of the opening part is polygonal and has 5.0-16.0μm width W8. The width W18 of the rectangular light shielding pattern is 1.0-4.0μm. COPYRIGHT: (C)2008,JPO&INPIT |
