PHOTOMASK, EXPOSURE DEVICE AND METHOD

摘要

PROBLEM TO BE SOLVED: To improve use efficiency of light in entire lithography by efficiently utilizing excessive spectra generating at shorter wavelengths than i-line without abandoning.

SOLUTION: A material having a band gap wavelength of near 365 nm between the conduction band and the valence band is disposed in a path from a light source to a substrate so that the material receives rays at wavelengths shorter than the band gap wavelength in the light emitting from the light source, exciting electrons in the valence band to one of energy levels in the conduction band and inducing emission of light at the band gap wavelength from the conduction band by the excited electrons.

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