| 摘要 |
A substrate drying apparatus is provided to prevent spots on the substrate during vacuum drying and uniformly drying the substrate by removing generation of a local airflow when reducing a pressure within a chamber to prevent generation of a local temperature difference of a substrate. A substrate drying apparatus comprises a chamber(100), a mount table(120) an opening(124) and an opening/closing plate(140). The mount table is installed within the chamber and divides the chamber into first and second spaces. The opening is formed in the mount table. At least one side of the opening is prolonged from the outside of the mount table so that an end effector(54) of a robot arm can be inserted. The opening/closing plate opens or closes the opening formed in the mount table. |
