发明名称 Nanostructured integrated circuits with capacitors
摘要 A nanostructured integrated circuit including a nanostructured element and a thin film transistor (TFT) and capacitor formed along the nanostructured element. The nanostructured element includes: an inner semiconductor material; and an outer insulating layer. The TFT includes: the inner semiconductor material of the nanostructured element; a source electrode electrically coupled to a source portion of the inner semiconductor material; a drain electrode electrically coupled to a drain portion of the inner semiconductor material; a gate portion of the outer insulating layer located between the source electrode and the drain electrode; and a gate electrode formed on the gate portion. The capacitor includes: a capacitor portion of the outer insulating layer of the nanostructured element; and a capacitor electrode formed on the capacitor portion. The capacitor portion of the outer insulating layer is located between the gate portion of the outer insulating layer and either the drain or source electrode.
申请公布号 US2008006883(A1) 申请公布日期 2008.01.10
申请号 US20060474645 申请日期 2006.06.26
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 MORI KIYOTAKA
分类号 H01L29/76;H01L29/04;H01L29/94 主分类号 H01L29/76
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