发明名称 DUAL CURE B-STAGEABLE UNDERFILL FOR WAFER LEVEL
摘要 <p>A silicon wafer has a B-stageable underfill material deposited on the active face of the wafer. The B-stageable underfill comprises a first composition with a lower curing temperature and a second composition with a higher curing temperature, characterized in that the first composition has been fully cured.</p>
申请公布号 EP1461829(B1) 申请公布日期 2008.01.09
申请号 EP20020805072 申请日期 2002.11.19
申请人 NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION 发明人 MA, BODAN;LEHMANN, SUN-HEE;TONG, QUINN, K.
分类号 H01L21/56;C08G59/18;H01L23/12;H01L23/29;H01L23/31 主分类号 H01L21/56
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