| 摘要 |
A method of fabricating an LCD is provided to omit two mask processes by forming source/drain electrode and a pixel electrode through one mask process and omitting a contact hole mask process for the pixel electrode. A first substrate divided into a pixel part and a circuit part is provided. An active pattern(224') is formed at the pixel part and the circuit part. A first insulating layer is formed on the first substrate. A gate electrode is formed at the pixel part and the circuit part, and a common line(208) is formed at the pixel part. P+ source/drain regions are formed at a predetermined region of the active pattern. A first interlayer insulating layer and a second interlayer insulating layer are formed on the first substrate. Portions of the first insulating layer, the first interlayer insulating layer and the second interlayer insulating layer are removed to form a first contact hole(240a) and a second contact hole(240b) exposing a source region(224a) and a drain region(224b) of the active pattern. A source electrode(222) and a drain electrode(223) electrically connected to the source region and the drain region of the active pattern through the first contact hole and the second contact hole are formed, and a pixel electrode(218) connected with the drain electrode is formed. A second substrate is provided. A liquid crystal layer is formed on any one of the first substrate and the second substrate. The first substrate and the second substrate are bonded with each other.
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