A PLASMA ELECTRON DENSITY AND ELECTRON TEMPERATURE MONITORING DEVICE AND METHOD THEREOF

摘要

A device for monitoring an electron density and an electron temperature in a plasma state and a method for monitoring the same are provided to check simultaneously a state of a process device and be utilized as the process device with reliability by being used as a real-time monitoring device for a plasma state. A device for monitoring an electron density and an electron temperature in a plasma state includes an electromagnetic generator(300), an electromagnetic transmitter/receiver(200), a frequency analyzer(400), and a computer(500). The electromagnetic generator continuously transmits an electromagnetic wave of a sequence of a frequency band. The electromagnetic wave is related to the plasma state in a reaction chamber so as to have a correlation between the plasma electron density and the electron temperature, and transmits the electromagnetic wave electrically connected to the electromagnetic generator. The frequency analyzer is electrically connected to the electromagnetic transmitter/receiver so as to analyze the frequency of the electromagnetic wave received from the electromagnetic transmitter/receiver.