发明名称 |
PROCESS FOR PRODUCING HIGH-PURITY HEXAFLUOROPROPYLENE AND CLEANING GAS |
摘要 |
<p>A process for industrially advantageously producing high-purity hexafluoropropylene; and a use of this high-purity hexafluoropropylene, specifically, a cleaning gas for removing deposits in a semiconductor manufacturing apparatus or liquid-crystal manufacturing apparatus. In the process for high-purity hexafluoropropylene production, crude hexafluoropropylene produced by the pyrolysis of chlorodifluoromethane is purified to thereby produce high-purity hexafluoropropylene. It comprises: a step (1) in which the crude hexafluoropropylene is brought into contact with an adsorbent comprising a zeolite having an average micropore diameter of 3.4-11 Å and/or a carbonaceous adsorbent having an average micropore diameter of 3.5-11 Å to reduce the content of chlorine compounds and/or hydrocarbons in the crude hexafluoropropylene; and a step (2) in which the hexafluoropropylene obtained in the step (1) is distilled to reduce the content of low-boiling ingredients therein.</p> |
申请公布号 |
WO2008001844(A1) |
申请公布日期 |
2008.01.03 |
申请号 |
WO2007JP62995 |
申请日期 |
2007.06.28 |
申请人 |
SHOWA DENKO K.K.;OHNO, HIROMOTO;OHI, TOSHIO |
发明人 |
OHNO, HIROMOTO;OHI, TOSHIO |
分类号 |
C07C17/38;C07C17/383;C07C17/389;C07C21/18;C23C16/44;H01L21/205;H01L21/3065 |
主分类号 |
C07C17/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|