发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 The performance of a sensor in a semiconductor device can be improved. A plurality of oscillators forming an ultrasonic sensor are arranged on a main surface of a semiconductor chip. A negative-type photosensitive insulating film which protects the oscillators is deposited on an uppermost layer of the semiconductor chip. At the time of exposure for forming an opening in the photosensitive insulating film, the semiconductor chip is divided into a plurality of exposure areas and exposed, and then, the exposure areas are jointed so that the entire area is exposed. At this time, a stitching exposure area is arranged so that a center of the stitching exposure area in a width direction in the joint portion of the adjacent exposure areas is positioned at a center of a line which connects centers of oscillators located above and below the stitching exposure area.
申请公布号 US2008001239(A1) 申请公布日期 2008.01.03
申请号 US20070767602 申请日期 2007.06.25
申请人 ENOMOTO HIROYUKI;HAYANO KATSUYA;MACHIDA SHUNTARO 发明人 ENOMOTO HIROYUKI;HAYANO KATSUYA;MACHIDA SHUNTARO
分类号 H01L29/84;H01L21/02 主分类号 H01L29/84
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