Metal pattern for measuring plasma charging in semiconductor device,申请号KR20020081989-传众专利搜索

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发明名称	Metal pattern for measuring plasma charging in semiconductor device
摘要
申请公布号	KR100790733(B1)	申请公布日期	2007.12.31
申请号	KR20020081989	申请日期	2002.12.20
申请人		发明人
分类号	H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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