PHOTOSENSITIVE RESIN COMPOSITION AND BUMP FOR CONTROLLING LIQUID CRYSTAL ALIGNMENT USING THE SAME

摘要

A photosensitive resin composition is provided to form a good pattern in alkali development after exposure by restricting an acid number of a photopolymerizable compound within a predetermined range. A photosensitive resin composition is installed within a liquid crystal cell of a plurally divided vertical alignment mode, and forms a bump for controlling alignment of liquid crystals. The photosensitive resin composition contains (A) a photopolymerizable compound, (B) a photopolymerization initiator, and (C) a pigment. The photopolymerizable compound(A) has an acid number of 40-160 mg KOH/g. The pigment is contained in an amount of 10-60% by mass based on the total solid components except solvent.