| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method therefor surely obtaining a resistor having an accurate resistance value, regarding the semiconductor device loading a polysilicon resistor as an element. SOLUTION: In the semiconductor device, the polysilicon resistor in the semiconductor device loading the polysilicon resistor comprises a polysilicon layer (113) formed in a desired shape, and an impurity diffusion layer (114) formed so as to diffuse impurities to the side inner than the shape of the polysilicon layer (113) in the polysilicon layer (113). COPYRIGHT: (C)2008,JPO&INPIT
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