| 发明名称 |
METHOD FOR PRODUCING THIN LAYERS OF A SILICON, AND THIN SILICON |
| 摘要 |
The invention relates to a method for producing thin layers (3) of a silicon that can be subjected to plastic treatment, whereby the silicon layer (3) is extruded, and to the thin silicon layer produced by said method. |
| 申请公布号 |
WO2007147811(A2) |
申请公布日期 |
2007.12.27 |
| 申请号 |
WO2007EP56040 |
申请日期 |
2007.06.18 |
| 申请人 |
HUHTAMAKI FORCHHEIN ZWEIGNIEDERLASSUNG DER HUHTAMAKI DEUTSCHLAND GMBH & CO KG;STARK, KURT;SCHMIDT, WERNER;GUENTER, WALTER |
发明人 |
STARK, KURT;SCHMIDT, WERNER;GUENTER, WALTER |
| 分类号 |
B32B25/20;B32B27/28;B32B37/15 |
主分类号 |
B32B25/20 |
| 代理机构 |
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