PROCESS FOR PATTERNING THIN-FILM OF SOLUTION TYPE

摘要

A method for forming a pattern of a solution type using a super-hydrophobic material is provided to form a self-aligned pattern by forming a material with super-hydrophobicity on the surface of a substrate and by using surface repulsion power between the super-hydrophobic material and a functional group of a solvent in which a device material is distributed. A hydrophobic material selected from dialkyl ketone, alkyl ketone dimer or a composition thereof is applied to a selected region of a substrate(100) to form a hydrophobic monolayer(110). A solution containing a device material distributed to a solvent with a hydrophobic functional group or hydrophilic functional group is deposited on the front surface of the substrate with the hydrophobic monolayer. A heat treatment is performed on the substrate with the device material to form a pattern on the substrate. The process for forming a hydrophobic monolayer can include the following steps. A hydrophobic material is applied to the upper surface of the substrate. The hydrophobic material is melted. The hydrophobic material is cooled.