| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus compensating for the thermal non-uniformity of a patterning device. <P>SOLUTION: A lithographic apparatus has: a heater that is formed for supplying energy for heating a patterning device to the patterning device and for forming a predetermined thermal distortion pattern of the patterning device; and a controller that is formed for performing optical correction corresponding to the predetermined thermal distortion pattern in the device in order to reduce the influence of the thermal distortion of the patterning device on the pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT |
