发明名称 METHOD FOR FILM FORMATION, MOLD, AND METHOD FOR MANUFACTURING MOLD
摘要 <p>This invention provides a method for film formation, which can form a film having no significant defect, a mold manufactured by using the method for film formation, and a method for manufacturing a mold. It has been found that a reduction in hydrogen gas as a carrier gas increases free carbon which is causative of an increase in occurrence of concave part in the working of a molding transfer face. Unlike the prior art technique in which the amount of hydrogen gas used in thermal CVD is 2 moles, studies conducted by the present inventor have revealed that, when the amount of the hydrogen gas is not less than 3 moles, the occurrence of the concave part can be significantly suppressed. The amount of the hydrogen gas is preferably up to about 8 moles from the practical standpoint, because, when the amount of the hydrogen gas is excessively large, the starting gas is diluted on the whole and, consequently, the reaction rate is lowered resulting in lowered film formation rate.</p>
申请公布号 WO2007139015(A1) 申请公布日期 2007.12.06
申请号 WO2007JP60699 申请日期 2007.05.25
申请人 KONICA MINOLTA OPTO, INC.;HOSOE, SHIGERU;MATSUDA, HIROYUKI 发明人 HOSOE, SHIGERU;MATSUDA, HIROYUKI
分类号 C23C16/42;C03B11/00;C23C16/32 主分类号 C23C16/42
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