| 摘要 |
<p>An exposure method is provided with a first step of measuring position information of a substrate (P) while shifting the substrate stage (PST) by controlling the substrate stage (PST) in a status where a light path space (K1) is filled with a liquid (LQ) under prescribed conditions; a second step of obtaining a shift control accuracy of the substrate stage (PST) based on the measurement results; a third step of deciding exposure conditions for exposing the substrate (P) based on the obtained shift control accuracy; and a fourth step of exposing the substrate (P) based on the decided exposure conditions. Thus, the substrate can be excellently exposed at the time of exposing the substrate based on a liquid immersion method.</p> |
