CHARGE BEAM DRAWING DEVICE AND CHARGE BEAM DRAWING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a charge beam drawing device and method therefor which reduce the standby time for maintaining the temperature of a glass substrate 1 at the same temperature as the temperature in a sample chamber 5. SOLUTION: The charge beam drawing device 50 consists of a cassette stocker 2 in which plural glass substrates 1 are housed in a direction where the glass substrates are transported, a spare chamber 12 which internally has a temperature control means 14, an evacuatable load locking chamber 3, a robot chamber 4 which is internally evacuated to a vacuum during the operation of the device and a sample chamber 5 which is internally evacuate to vacuum during the operation of the device and where the glass substrates 1 are subjected to drawing. The sample chamber 5 is internally provided with a stage 10 which may be loaded with the glass substrates 1. The upper part of the sample chamber 5 is provided with an electron gun for emitting an electron beam and a lens barrel 11 having various kinds of apertures, lenses, deflectors, etc., for forming the electron beam to a pattern shape. The temperature of the glass substrates 1 may be rapidly maintained at the same temperature as the temperature in the sample chamber 5 by such constitution of the spare chamber 12.