| 摘要 |
<p>A method and an apparatus for forming a pattern is provided to uniformly control amount of a resin material disposed between a mold and a substrate during an imprint operation by using a coating unit. A pattern forming apparatus includes a mold maintaining unit for maintaining a mold(105), a substrate maintaining unit for maintaining a substrate(104), and a coating unit(109) for coating a pattern forming material onto the substrate. A pattern is formed on the pattern forming material over the substrate by using an imprint pattern formed on the mold. The substrate having a pattern forming region is prepared. The pattern forming material of a non-hardened state is arranged on plural positions of the pattern forming region at irregular intervals. The pattern forming material is deformed into a shape corresponding to the imprint pattern formed on the mold. Thereafter, the pattern forming material is hardened.</p> |
