| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid having an extremely high transparency and a refractive index higher than that of water in a wavelength not more than 200 nm known as a vacuum ultraviolet region in a liquid-immersion exposure process, and to provide a resist pattern forming method using the same. <P>SOLUTION: A liquid for liquid immersion exposure process contains a saturated hydrocarbon compound and has a content not less than a specific concentration of a compound having a double bond structure as a penetration inhibitor, and/or a compound having an aldehyde structure, and/or a compound having a carbonyl structure, and/or a compound having a carboxyl structure. Using this liquid enables to form an excellent resist pattern in the liquid immersion exposure process using an ultraviolet light of a wavelength not more than 200 nm. <P>COPYRIGHT: (C)2008,JPO&INPIT |
