发明名称 |
METHOD FOR MAKING A PHOTOVOLTAIC CELL BASED ON THIN-FILM SILICON |
摘要 |
<p>The invention concerns a method for making a photovoltaic cell based on thin film silicon, which consists in providing a heterojunction by depositing on a support at least one first P- (or N-) doped amorphous silicon layer (13) and a second N- (or P-) doped amorphous silicon layer (14), in crystallizing, at least partly, the at least one first layer (13) using a technology for crystallizing silicon by pulsed electronic beam.</p> |
申请公布号 |
EP1861882(A1) |
申请公布日期 |
2007.12.05 |
申请号 |
EP20060726258 |
申请日期 |
2006.03.20 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
HUET, STEPHANIE;JULIET, PIERRE;DUCROS, CEDRIC;SANCHETTE, FREDERIC |
分类号 |
H01L31/18;H01L31/0745;H01L31/20 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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