发明名称 METHOD FOR MAKING A PHOTOVOLTAIC CELL BASED ON THIN-FILM SILICON
摘要 <p>The invention concerns a method for making a photovoltaic cell based on thin film silicon, which consists in providing a heterojunction by depositing on a support at least one first P- (or N-) doped amorphous silicon layer (13) and a second N- (or P-) doped amorphous silicon layer (14), in crystallizing, at least partly, the at least one first layer (13) using a technology for crystallizing silicon by pulsed electronic beam.</p>
申请公布号 EP1861882(A1) 申请公布日期 2007.12.05
申请号 EP20060726258 申请日期 2006.03.20
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 HUET, STEPHANIE;JULIET, PIERRE;DUCROS, CEDRIC;SANCHETTE, FREDERIC
分类号 H01L31/18;H01L31/0745;H01L31/20 主分类号 H01L31/18
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