发明名称 MATERIAL TREATMENT METHOD BY LASER ABLATION AND MATERIAL TREATED BY THE TREATMENT METHOD
摘要 There is provided a material treatment method using laser ablation capable of easily controlling the laser pulse width and effectively performing treatment with a high accuracy. When a two-logarithm graph is expressed by a horizontal axis indicating the laser pulse width in pico seconds and a vertical axis indicating the ablation threshold value in J/cm^2, a material having a region where the two-logarithm graph has a rectilinear shape with gradient of 0.5 or below is subjected to treatment by a pulse laser beam having a laser pulse width within the region.
申请公布号 KR20070114372(A) 申请公布日期 2007.12.03
申请号 KR20077022151 申请日期 2007.09.28
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MISHIMA HIDEHIKO;MASUDA YASUHITO;OKUDA YASUHIRO;WATATANI KENICHI;SAKABE SHUJI;HASHIDA MASAKI;SHIMIZU SEIJI
分类号 B23K26/40;B23K26/00 主分类号 B23K26/40
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