发明名称 |
MATERIAL TREATMENT METHOD BY LASER ABLATION AND MATERIAL TREATED BY THE TREATMENT METHOD |
摘要 |
There is provided a material treatment method using laser ablation capable of easily controlling the laser pulse width and effectively performing treatment with a high accuracy. When a two-logarithm graph is expressed by a horizontal axis indicating the laser pulse width in pico seconds and a vertical axis indicating the ablation threshold value in J/cm^2, a material having a region where the two-logarithm graph has a rectilinear shape with gradient of 0.5 or below is subjected to treatment by a pulse laser beam having a laser pulse width within the region. |
申请公布号 |
KR20070114372(A) |
申请公布日期 |
2007.12.03 |
申请号 |
KR20077022151 |
申请日期 |
2007.09.28 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
MISHIMA HIDEHIKO;MASUDA YASUHITO;OKUDA YASUHIRO;WATATANI KENICHI;SAKABE SHUJI;HASHIDA MASAKI;SHIMIZU SEIJI |
分类号 |
B23K26/40;B23K26/00 |
主分类号 |
B23K26/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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