| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for preventing particles from being produced to form a thin film of high quality. SOLUTION: A driving method includes alternately repeating a first state of supplying a nitriding gas only to a first film-forming chamber 20 while supplying a sputtering gas to the first film-forming chamber 20 and a second chamber 30, and a second state of supplying the nitriding gas only to the second film-forming chamber 30 while supplying the sputtering gas to the first film-forming chamber 20 and the second chamber 30 to alternately sputter targets 25 and 35. The method switches the first and second states before a TiN film grows on a deposition shield 26 and 36 in the first and second film-forming chambers 20 and 30 to such film thickness as easily tends to exfoliate, and besides forms a Ti film on the TiN film to cover the TiN film after having switched the first and second states. Accordingly, the TiN film does not exfoliate and consequently particles are not produced. COPYRIGHT: (C)2008,JPO&INPIT
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