| 摘要 |
<p>A drain contact hole mask is provided to form a drain contact hole pattern while using exposure equipment with a small numerical aperture by alternately disposing light transmission regions at regular intervals in a light blocking region. A drain contact hole mask includes a light transmission region and a light blocking region(300). A plurality of light transmission regions(320) are alternately disposed in the light blocking region to have the same center wherein the plurality of light transmission regions are separated from each other by a predetermined interval. The pitch of the light transmission regions whose partial region is overlapped can maintain an interval of B. The pitch of the alternately disposed light transmission regions can maintain an interval of C which is twice as long as the interval B.</p> |
