发明名称 |
Method of Molding Silica Glass |
摘要 |
A method of molding a silica glass comprises: a first step of accommodating the silica glass containing OH groups in a concentration of 900 ppm to 1300 ppm by mass in a hollow portion of a mold provided with a press portion; a second step of molding the silica glass in a predetermined form by pressing the same by means of the pressing portion so that a maximum pressure can be 0.2 Kg/cm<SUP>2 </SUP>to 0.8 Kg/cm<SUP>2 </SUP>while heating the silica glass so that the temperature of the same can be within a hold temperature range of 1530° C. to 1630° C.; and a third step of cooling the molded silica glass.
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申请公布号 |
US2007271958(A1) |
申请公布日期 |
2007.11.29 |
申请号 |
US20050631310 |
申请日期 |
2005.06.29 |
申请人 |
NIKON CORPORATION |
发明人 |
ABE TETSUYA;YAJIMA SHOUJI |
分类号 |
C03B32/00;C03B5/00;C03B7/14;C03B11/00;C03B20/00;G03F1/60;H01L21/027 |
主分类号 |
C03B32/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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