发明名称 Barrier layer for fine-pitch mask-based substrate bumping
摘要 A structure that may be used in substrate solder bumping comprises a substrate ( 110 ), a solder resist layer ( 120 ) disposed over the substrate, a plurality of solder resist openings ( 121 ) in a surface ( 122 ) of the solder resist layer, a conformal barrier layer ( 130 ) having a first portion ( 131 ) over the surface of the solder resist layer and a second portion ( 132 ) in the solder resist openings, a mask layer ( 140 ) over the first portion of the conformal barrier layer, and a solder material ( 150 ) in the solder resist openings over the metal layer. The conformal barrier layer acts as a barrier against interaction between the solder resist layer and the mask layer during solder reflow.
申请公布号 US2007275550(A1) 申请公布日期 2007.11.29
申请号 US20060441841 申请日期 2006.05.26
申请人 发明人 NALLA RAVI K.;TSAU CHRISTINE H.;HLAD MARK S.
分类号 H01L21/44;H01L21/00 主分类号 H01L21/44
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