| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas supplying nozzle which can reduce a production cost and can certainly obtain a uniform flow, even if a kind of material gas etc. changes, and a semiconductor manufacturing equipment equipped with it. SOLUTION: A gas supplying nozzle 4 has a gas introduction inlet 4A and gas discharge outlet 4B, where a second gas supplying way 4D is formed whose size in widthwise direction becomes increasingly large from the gas introduction inlet 4A to the gas discharge outlet 4B. On the way in the direction of gas supply of the nozzle 4, a barrier 7 is located to dam up a gas flow on the gas supplying way. COPYRIGHT: (C)2008,JPO&INPIT
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